Technical Notes:
1.ALD/CVD precursor mainly used for TiN 1 ,review and TiO2 based thin film de positions .
References:
1.J.Appl Phys. 2013 113. 021301.
2.Microelectron Eng 2009 86 72
3.J Vac. Sci Tech A 2018 36 06A105
4.Appl Surf Sci 2018 462. 1029
5.J App. Phys. 2007. 102. 083521
6.J Electrochem. Soc. 2008 155. H688.
Strem
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