Technical Notes:
1. ALD/CVD precursor for Hf thin film deposition.
References:
1.Chem. Mater. 2002, 14, 4350.
2.Chem. Vap. Deposition 2002. 8 1 99.
3.J. Electrochem. Soc. 2005, 152, G213.
4.Chem. Mater.2004, 16, 3497 .
Strem
Tungsten boride
硼化钨
铼微球, Rhenium pellets
四丁基四硫代铼酸铵(VII), Tetrabutylammonium tetrathiorhenate(VII)
Rhenium pentacarbonyl chloride
氯代五羰基铼
铱 (I) 四氟硼酸盐, Bis(acetonitrile)(1,5-cyclooctadiene)iridium(I) tetrafluoroborate
Chlorocarbonylbis(triphenylphosphine)iridium(I)
氯羰基双(三苯基磷)铱
[5,5'-双(三氟甲基)-2,2'-联吡啶-κN,κN]双[3,5-二氟-2- [5-(三氟甲基)-2-吡啶基-κN]苯基]六氟磷酸铱, [5,5'-Bis(trifluoromethyl)-2,2'-bipyridine-κN,κN]bis[3,5-difluoro-2-[5-(trifluoromethyl)-2-pyridinyl-κN]phenyl] iridium hexafluorophosphate
氯(五甲基环戊二烯){5-硝基-2-{1- [(4-甲氧基苯基)氨基-N-]乙基}苯基-KC}铱, Chloro(pentamethylcyclopentadienyl){5-nitro-2-{1-[(4-methoxyphenyl)imino-kN]ethyl}phenyl-kC}iridium(III)
1,5-Cyclooctadiene(acetylacetonato)iridium(I)
1,5-环辛二烯(乙酰乙酸)铱
Iridium carbonyl
十二羰基四铱