Technical Notes:
1.ALD/CVD precursor for molybdenum thin film deposition
References:
1.Chem. Mater. 2007. 19, 263.
2.Chem. Vap. Deposition 2008 14, 71.
3.Thin Solid Films 2008, 516, 6041 .
4.Surf Coat. Techn. 2008 202. 5103.
5.J. Vac. Sci Technol. A, 2014, 32, 01A119.
6.J. Vac. Sci. Technol A, 2016, 34, 01A103.
7.J. Vac. Sci Technol A 2019. 37. 010907.
8.Thin Solid Films 2019, 692, 137607.
9.J. Vac. Sci. Technol. A.2021. 39, 012407.
Strem