Technical Notes:
1. Volatile and thermally stable precursor for the growth of Co containing thin films by ALD and CVD. 2.The high reactivity of the precursor enables the growth of pure Co metal films at low temperatures with various
reducing agents .
References:
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2.Chem. Mater. 2016 28 700
3.Chem. Mater 2017 29 5796
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8.Appl Surf Sci 2020 510 144804.
Strem